aplanoXX_NA0.8_D20
High NA objectives with protective window,
compensating spherical aberration when focusing laser beam inside media
Applications:
- Microprocessing sapphire, fused silica, glass, Si, SiC
- 3D micro- and nanofabrication
- Nanostructuring in optical data storage and recording polarization converters
- Selective Laser Etching
- Waveguide writing
- Dicing
- Slicing
- Microscopy
Specifications
| aplanoXX_NA0.8_D20 | ||
| Description |
Objectives of aplanatic design with - function of compensation of spherical aberration that occurs when focusing in transparent media - protective window |
|
| Accessories |
- Window in Holder L9333.06 - Protective Window D12_1064, D12_515/1030, D12_800 - Spanner Wrench K-26-0.4x0.4 |
|
| Numerical aperture (NA) | 0.8 | |
| Clear Aperture, mm | 20 | |
| Focal length, mm | 12.5 | |
| Protective Window | D12, replaceable, in holder | |
| Working Distance, mm | - with window | 1.6 |
| - without window | 2.5 | |
| Range of focusing depth in fused silica*, μm | 0 ... 4000 | |
| Spectral band, nm |
_1030: 1020 - 1100 _800: 770 - 900 _515: 510 - 545 |
|
| Angular field of view * | ± 0.3° | |
| Recommended maximum pulse energy | 100 mJ at 5 ns 300 μJ at 1 ps |
|
| Mounting | C‐Mount (1"-32 UN 2A), external other threads available on request |
|
| Diameter, mm | 44 | |
| Length with window holder, mm | 54 | |
| * - by diffraction limited focusing. | ||
In-depth focusing inside transparent media never was so easy!
aplanoXX_NA0.5_D9
High NA objectives with protective window
Applications:
- Microprocessing sapphire, fused silica, glass, Si, SiC
- 3D micro- and nanofabrication
- Nanostructuring in optical data storage and recording polarization converters
- Selective Laser Etching
- Waveguide writing
- Dicing
- Slicing
Specifications
| aplanoXX_NA0.5_D9 | ||
| Description | Objectives of aplanatic design with protective window | |
| Accessories |
- Window in Holder L9855.02 (L9333.04) - Protective Window D12_1064, D12_515/1030, D12_800 - Spanner Wrench K-20.2-0.4x0.4 |
|
| Numerical aperture (NA) | 0.5 | |
| Clear Aperture, mm | 9 | |
| Focal length, mm | 8.5 | |
| Protective Window | D12, replaceable, in holder | |
| Working Distance, mm | - with window | 4.4 |
| - without window | 5.5 | |
| Range of focusing depth in fused silica*, μm | 0 ... 1000 | |
| Spectral band, nm |
_1030: 1020 - 1100 _800: 770 - 900 _515: 510 - 545 |
|
| Angular field of view * | ± 1° | |
| Recommended maximum pulse energy | 25 mJ at 5 ns 100 μJ at 1 ps |
|
| Mounting | C‐Mount (1"-32 UN 2A), external other threads available on request |
|
| Diameter, mm | 32 | |
| Length with window holder, mm | 36 (42 with adapter) | |
| * - by diffraction limited focusing. | ||
